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LP‐H: Late‐News Poster: New Photo‐Alignment Materials with High Sensitivity to Near‐UV Light
Author(s) -
Makita Y.,
Natsui T.,
Kimura S.,
Nakata S.,
Kimura M.,
Matsuki K.,
Takeuchi K.
Publication year - 1998
Publication title -
sid symposium digest of technical papers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.351
H-Index - 44
eISSN - 2168-0159
pISSN - 0097-966X
DOI - 10.1889/1.1833869
Subject(s) - chalcone , light sensitivity , photochemistry , degradation (telecommunications) , sensitivity (control systems) , chemistry , reactivity (psychology) , materials science , optoelectronics , computer science , organic chemistry , telecommunications , electronic engineering , engineering , medicine , alternative medicine , pathology
We developed new photo alignment materials based on chalcone structure with the high photo reactivity and high sensitivity to near UV light. Poly(4‐methacryloyloxy chalcone), PM4Ch, and its derivatives exhibited good LC alignment capability upon near UV exposure. The LC alignment capability was preserved when the LC cells were annealed at 170°C. The possible photochemical degradation by deep UV can be prevented by using these new materials.