Premium
A Cost Effective Method for Producing Anti‐Reflection Films
Author(s) -
Choi H. C.,
Jones R. L.,
Nagarkar P.,
Smyth W.,
Wang J.
Publication year - 1998
Publication title -
sid symposium digest of technical papers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.351
H-Index - 44
eISSN - 2168-0159
pISSN - 0097-966X
DOI - 10.1889/1.1833818
Subject(s) - scratch , reflectivity , reflection (computer programming) , materials science , range (aeronautics) , process engineering , computer science , composite material , optics , engineering , physics , programming language
A new method for producing high performance AR films at reasonable costs has been developed. This new approach can produce anti‐reflection films with a photopic reflectance of less than 0.8% while providing 3H scratch hardness and steel wool rub resistance. Good anti‐finger print performance is combined with an excellent ability to clean with any of the standard cleaning agents. This technology allows a range of “cost effective” AR products to be made commensurate with the application.