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Characterizing Thin Films in the Flat Panel Display Industry with Variable Angle Spectroscopic Ellipsometry (VASE®)
Author(s) -
Hilfiker James N.,
Synowicki Ron A.,
Hale Jeffrey S.,
Bungay Corey
Publication year - 1998
Publication title -
sid symposium digest of technical papers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.351
H-Index - 44
eISSN - 2168-0159
pISSN - 0097-966X
DOI - 10.1889/1.1833800
Subject(s) - materials science , ellipsometry , refractive index , thin film , silicon nitride , optoelectronics , indium tin oxide , silicon , amorphous silicon , optics , characterization (materials science) , flat panel display , amorphous solid , crystalline silicon , nanotechnology , crystallography , chemistry , physics
Abstract Variable Angle Spectroscopic Ellipsometry (VASE®) is a common characterization method for thin films used in the flat panel display industry. It is a precise and non‐destructive technique for determining refractive index and film thickness for single or multi‐layered films. The film properties can be mapped to ensure uniformity over large area panels. The application of VASE® for flat panel applications will be reviewed — including measurements of amorphous silicon, silicon nitride, silicon dioxide, liquid crystals, indium tin oxide (ITO), and multi‐layers of these materials.

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