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20.3,: A MIM‐Addressed 16‐in. EWS PDLC Display with Decreased Capacitance
Author(s) -
Koeberle M.,
Maier G.,
Lueder E.,
Kallfass T.
Publication year - 1998
Publication title -
sid symposium digest of technical papers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.351
H-Index - 44
eISSN - 2168-0159
pISSN - 0097-966X
DOI - 10.1889/1.1833753
Subject(s) - capacitance , materials science , fabrication , homogeneity (statistics) , pixel , optoelectronics , dielectric , backlight , optics , physics , computer science , liquid crystal display , electrode , medicine , alternative medicine , pathology , quantum mechanics , machine learning
Abstract We developed of a new fabrication process for MIMs to decrease the capacitance of the MIM. As a result of this the ratio C LC /C MIM is enlarged by a factor 5. The MIMs have a Ta 2 O 5 /Si 3 N 4 double dielectric layer from which the Si 3 N 4 ‐layer is structured by a self‐aligning backlighting process. With this process we achieved a very good homogeneity and a low defect rate of the MIM‐elements. The improvement of the MIMs is demonstrated by a 16 inch MIM‐addressed black and white EWS‐PDLC‐Display with 1280 × 1024 pixel sized 250μm × 250μm. To our knowledge this is the largest MIM‐display also exhibiting the highest pixel density realized so far.