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20.2: A Simple Reflective TFT‐LCD Fabrication Using Four Photomask Processes
Author(s) -
Yamaguichi Y.,
Kanoh H.,
Mukainari M.,
Ikeno H.,
Ikeda N.,
Hayama H.
Publication year - 1998
Publication title -
sid symposium digest of technical papers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.351
H-Index - 44
eISSN - 2168-0159
pISSN - 0097-966X
DOI - 10.1889/1.1833751
Subject(s) - photomask , liquid crystal display , thin film transistor , lightness , materials science , fabrication , optics , optoelectronics , computer graphics (images) , computer science , artificial intelligence , nanotechnology , resist , physics , medicine , alternative medicine , layer (electronics) , pathology
To reduce the production cost of reflective TFT‐LCDs, we have developed a method of fabricating TFT‐LCDS that is comprised of only four photo mask processes. Experimental black and white reflective LCDs fabricated with this method exhibit a lightness (L*) of 83, and no image parallax.