20.2: A Simple Reflective TFT‐LCD Fabrication Using Four Photomask Processes | Zendy

Yamaguichi Y. | Zendy; Kanoh H. | Zendy; Mukainari M. | Zendy; Ikeno H. | Zendy; Ikeda N. | Zendy; Hayama H. | Zendy

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20.2: A Simple Reflective TFT‐LCD Fabrication Using Four Photomask Processes

Author(s) -

Yamaguichi Y.,

Kanoh H.,

Mukainari M.,

Ikeno H.,

Ikeda N.,

Hayama H.

Publication year - 1998

Publication title -

sid symposium digest of technical papers

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.351

H-Index - 44

eISSN - 2168-0159

pISSN - 0097-966X

DOI - 10.1889/1.1833751

Subject(s) - photomask , liquid crystal display , thin film transistor , lightness , materials science , fabrication , optics , optoelectronics , computer graphics (images) , computer science , artificial intelligence , nanotechnology , resist , physics , medicine , alternative medicine , layer (electronics) , pathology

To reduce the production cost of reflective TFT‐LCDs, we have developed a method of fabricating TFT‐LCDS that is comprised of only four photo mask processes. Experimental black and white reflective LCDs fabricated with this method exhibit a lightness (L*) of 83, and no image parallax.

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