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18.2: Thin Coating of Anti‐Smudge Layer for AR Film on CRTs
Author(s) -
Hanaoka H.,
Ito O.,
Kaneko K.,
Kondo H.
Publication year - 1998
Publication title -
sid symposium digest of technical papers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.351
H-Index - 44
eISSN - 2168-0159
pISSN - 0097-966X
DOI - 10.1889/1.1833741
Subject(s) - coating , layer (electronics) , materials science , boiling point , reagent , chemical engineering , composite material , chemistry , organic chemistry , engineering
A coating method and process of an anti‐smudge layer on the Anti‐Reflection (AR) film are described. Several kinds of solvents were tested to achieve a very thin anti‐smudge layer using a direct gravure coater. Solvents for the anti‐smudge reagent were required suitable boiling point good volubility and low surface energy. Fluorinated solvents, i‐Propanol (IPA), and IPA mixed organic solvents met the requirements. The addition of a catalyst prevented a back print, which was one of most important technical point for the roll‐to‐roll coating. The film thickness of 3.5 nm exhibited excellent anti‐smudge property and also did not sigficantly affect AR properties.