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42.3: Development of a New HDP Source for LCD Etching Process
Author(s) -
Takei H.,
Kawamura H.,
Ohta Y.,
Gardner R.
Publication year - 1998
Publication title -
sid symposium digest of technical papers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.351
H-Index - 44
eISSN - 2168-0159
pISSN - 0097-966X
DOI - 10.1889/1.1833680
Subject(s) - etching (microfabrication) , substrate (aquarium) , resist , materials science , plasma etching , plasma , optoelectronics , flexibility (engineering) , liquid crystal display , process (computing) , nanotechnology , computer science , physics , statistics , mathematics , layer (electronics) , quantum mechanics , geology , operating system , oceanography
The new HDP (High Density Plasma) source with unique concept has been developed for large area etching process in the field of LCD application. Dual frequency excited plasma (DFEP) was employed and high rate etching performance such as 280nm/min of ITO and 1.7 μ m/min. Of photo resist was confirmed. This HDP source technique has flexibility to be applied for larger substrate.