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40.4: Optimization of Light‐Valve Mirrors
Author(s) -
Colgan E. G.,
Doany F.,
Lu M.,
Rosenbluth A.,
Yang K.H.,
Uda M.,
Shinohara M.,
Tomooka T.,
Tsukamoto T.
Publication year - 1998
Publication title -
sid symposium digest of technical papers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.351
H-Index - 44
eISSN - 2168-0159
pISSN - 0097-966X
DOI - 10.1889/1.1833671
Subject(s) - chemical mechanical planarization , polishing , hillock , materials science , reflectivity , optics , pixel , optoelectronics , composite material , physics
A mirror structure for reflective Si based light valves was fabricated using chemical mechanical polishing and a thin 150 nm Al(Cu)/Ti mirror to minimize hillock formation. The use of chemical‐mechanical polishing planarization resulted in only a 1% loss in reflectivity from topography under the mirrors. The reflectivity for pixel sizes from 7.5–40 μm and 0.7 or 0.5 μm gaps were measured and the performance of TN LC pixels with different sizes and inversion methods are reported.