P‐37: Field Emission from Carbon Nanotubes Grown by Layer‐by‐layer Deposition Method Using Plasma Chemical Vapor Deposition | Zendy

Chung Suk Jae | Zendy; Lim Sung Hoon | Zendy; Jang Jin | Zendy

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P‐37: Field Emission from Carbon Nanotubes Grown by Layer‐by‐layer Deposition Method Using Plasma Chemical Vapor Deposition

Author(s) -

Chung Suk Jae,

Lim Sung Hoon,

Jang Jin

Publication year - 2000

Publication title -

sid symposium digest of technical papers

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.351

H-Index - 44

eISSN - 2168-0159

pISSN - 0097-966X

DOI - 10.1889/1.1833036

Subject(s) - carbon nanotube , layer (electronics) , materials science , graphite , amorphous carbon , deposition (geology) , chemical vapor deposition , layer by layer , field electron emission , plasma , carbon fibers , carbon film , chemical engineering , plasma enhanced chemical vapor deposition , nanotechnology , substrate (aquarium) , amorphous solid , plasma processing , thin film , composite material , chemistry , organic chemistry , composite number , electron , oceanography , engineering , biology , paleontology , quantum mechanics , physics , sediment , geology

We developed a noble carbon nanotube (CNT) deposition method using a layer‐by‐layer technique, in which the deposition of a thin layer CNT and a CF 4 plasma exposure on its surface were carried out alternatively. Owing to the difference in the etch rate between amorphous carbon, graphite and CNTs by CF 4 plasma, we can selectively etch away the unwanted amorphous carbon and graphite phases from the CNTs. The new CNTs deposited on glass substrate exhibited a turn‐on field of 1.2 V/μm.

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