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P‐37: Field Emission from Carbon Nanotubes Grown by Layer‐by‐layer Deposition Method Using Plasma Chemical Vapor Deposition
Author(s) -
Chung Suk Jae,
Lim Sung Hoon,
Jang Jin
Publication year - 2000
Publication title -
sid symposium digest of technical papers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.351
H-Index - 44
eISSN - 2168-0159
pISSN - 0097-966X
DOI - 10.1889/1.1833036
Subject(s) - carbon nanotube , layer (electronics) , materials science , graphite , amorphous carbon , deposition (geology) , chemical vapor deposition , layer by layer , field electron emission , plasma , carbon fibers , carbon film , chemical engineering , plasma enhanced chemical vapor deposition , nanotechnology , substrate (aquarium) , amorphous solid , plasma processing , thin film , composite material , chemistry , organic chemistry , composite number , electron , oceanography , engineering , biology , paleontology , quantum mechanics , physics , sediment , geology
We developed a noble carbon nanotube (CNT) deposition method using a layer‐by‐layer technique, in which the deposition of a thin layer CNT and a CF 4 plasma exposure on its surface were carried out alternatively. Owing to the difference in the etch rate between amorphous carbon, graphite and CNTs by CF 4 plasma, we can selectively etch away the unwanted amorphous carbon and graphite phases from the CNTs. The new CNTs deposited on glass substrate exhibited a turn‐on field of 1.2 V/μm.