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29.2: New Photo Alignment Technology Based on •‐(4‐Chalconyloxy) Alkyl Groups
Author(s) -
Kimura M.,
Nakata S.,
Makita Y.,
Matsuki Y.,
Kumano A.,
Takeuchi Y.,
Yokoyama H.
Publication year - 2000
Publication title -
sid symposium digest of technical papers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.351
H-Index - 44
eISSN - 2168-0159
pISSN - 0097-966X
DOI - 10.1889/1.1832975
Subject(s) - alkyl , rubbing , styrene , materials science , optoelectronics , computer science , chemistry , copolymer , organic chemistry , composite material , polymer
This paper describes a new photo alignment method based on the •‐(4‐Chalconyloxy) Alkyl side group with styrene units and phenylmaleimide units. We compared the proposed photo alignment method with the rubbing method and found that there was a gain in anchoring energy at the interface between the alignment film and LC. Furthermore, we found the improvement in TN cell electro‐optical characteristics when we used this new photo alignment method. We think this photo alignment method was available in practical applications.