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28.4: Matrix Flat‐Panel Application of Ballistic Electron Surface‐Emitting Display
Author(s) -
Komoda Takuya,
Honda Yoshiaki,
Hatai Takashi,
Watabe Yoshifumi,
Ichihara Tsutomu,
Aizawa Koichi,
Kondo Yukihiro,
Koshida Nobuyoshi
Publication year - 2000
Publication title -
sid symposium digest of technical papers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.351
H-Index - 44
eISSN - 2168-0159
pISSN - 0097-966X
DOI - 10.1889/1.1832973
Subject(s) - materials science , cathode , flat panel display , flat panel , fabrication , optoelectronics , silicon , matrix (chemical analysis) , active matrix , process (computing) , dot pitch , electron , pixel , nanotechnology , optics , electrical engineering , computer science , composite material , thin film transistor , engineering , physics , medicine , alternative medicine , pathology , layer (electronics) , quantum mechanics , operating system
Ballistic electron Surface‐emitting cold cathode based on porous polysilicon exhibits excellent performance as a novel flat panel display. It is demonstrated that emission current is stable up to an ambient pressure of 10 Pa. 53(RGB) × 40 pixels multicolour matrix panel is fabricated and evaluated its performance. Fabricating process is mainly based on conventional silicon process and anodisation process, for which we can expect lower production cost at larger panel fabrication.