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53.1: 2.6 inch HDTV Panel Using CG Silicon
Author(s) -
Sakamoto Hiromi,
Makita Naoki,
Hijikigawa Masaya,
Osame Mitsuaki,
Tanada Yoshifumi,
Yamazaki Shumpei
Publication year - 2000
Publication title -
sid symposium digest of technical papers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.351
H-Index - 44
eISSN - 2168-0159
pISSN - 0097-966X
DOI - 10.1889/1.1832878
Subject(s) - silicon , materials science , substrate (aquarium) , optoelectronics , geology , oceanography
Abstract 2.6 inch HDTV panel has been developed on the CORNINNG 1737 glass substrate using low temperature CG Silicon (Continuous Grain Silicon). This time we have fabricated TFTs using CG Silicon which uses crystallization with metal catalyst (Ni) and the process to remove this catalyst from channel regions by gettering below 550[°C].