42.4: Novel Manufacturing Process of TFT‐LCD Featuring C/F on Array and Its Applications | Zendy

Song JeanHo | Zendy; Kim S. G. | Zendy; Nam H. W. | Zendy; Roh S. G. | Zendy; Lee J. H. | Zendy; Sakong D. S. | Zendy; Souk J. H. | Zendy

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42.4: Novel Manufacturing Process of TFT‐LCD Featuring C/F on Array and Its Applications

Author(s) -

Song JeanHo,

Kim S. G.,

Nam H. W.,

Roh S. G.,

Lee J. H.,

Sakong D. S.,

Souk J. H.

Publication year - 2000

Publication title -

sid symposium digest of technical papers

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.351

H-Index - 44

eISSN - 2168-0159

pISSN - 0097-966X

DOI - 10.1889/1.1832836

Subject(s) - color gel , thin film transistor , brightness , liquid crystal display , materials science , filter (signal processing) , optoelectronics , aperture (computer memory) , pixel , process (computing) , computer science , computer hardware , nanotechnology , engineering , optics , mechanical engineering , artificial intelligence , computer vision , layer (electronics) , physics , operating system

We evaluated new manufacturing process featuring with integration of C/F and TFT Array, Rigid spacer as an assistant black matrix, and organic insulator for multi‐purpose of color filter protection and C/F via hole formation. By combining with conventional 5 mask TN mode of top pixel electrode architecture, we could develop novel manufacturing process for displaying performance enhancement and improved productivity. 15.0 inch‐XGA prototype panel with up to 80% of final aperture ratio and 25% increase of display brightness was fabricated.

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