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42.4: Novel Manufacturing Process of TFT‐LCD Featuring C/F on Array and Its Applications
Author(s) -
Song JeanHo,
Kim S. G.,
Nam H. W.,
Roh S. G.,
Lee J. H.,
Sakong D. S.,
Souk J. H.
Publication year - 2000
Publication title -
sid symposium digest of technical papers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.351
H-Index - 44
eISSN - 2168-0159
pISSN - 0097-966X
DOI - 10.1889/1.1832836
Subject(s) - color gel , thin film transistor , brightness , liquid crystal display , materials science , filter (signal processing) , optoelectronics , aperture (computer memory) , pixel , process (computing) , computer science , computer hardware , nanotechnology , engineering , optics , mechanical engineering , artificial intelligence , computer vision , layer (electronics) , physics , operating system
We evaluated new manufacturing process featuring with integration of C/F and TFT Array, Rigid spacer as an assistant black matrix, and organic insulator for multi‐purpose of color filter protection and C/F via hole formation. By combining with conventional 5 mask TN mode of top pixel electrode architecture, we could develop novel manufacturing process for displaying performance enhancement and improved productivity. 15.0 inch‐XGA prototype panel with up to 80% of final aperture ratio and 25% increase of display brightness was fabricated.