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57.4: The Effect of the Roughness of the Glass Substrate on the Roughness of the Barrier Layer Used During Fabrication of Poly‐Si TFTs
Author(s) -
Shah Himanshu C.,
Davis Ronald W.
Publication year - 2003
Publication title -
sid symposium digest of technical papers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.351
H-Index - 44
eISSN - 2168-0159
pISSN - 0097-966X
DOI - 10.1889/1.1832573
Subject(s) - materials science , substrate (aquarium) , layer (electronics) , surface finish , barrier layer , surface roughness , diffusion barrier , composite material , fabrication , medicine , oceanography , alternative medicine , pathology , geology
During the fabrication of top gate poly‐Si TFT array for active matrix LCD applications, the glass substrate is coated with the barrier layer to prevent the diffusion of impurities from the glass to the TFT. In the present study, we have focused on the effect of the roughness of the glass substrate (fusion formed and polished) on the roughness of the barrier layer deposited on the glass substrate. The fusion formed substrates (1737 and EAGLE 2000™ , Corning) and the polished substrate from a competitor were coated with a barrier layer and the roughness of the barrier layer was measured by AFM. The roughness of the barrier layer deposited on the fusion formed substrates is much lower than that formed on the polished substrate. Thus roughness of the glass substrate strongly influences the roughness of the barrier layer deposited on the substrate.