29.2: Low‐Cost Barrier Rib and Address Electrode Formation for a 42‐in. High‐Definition PDP | Zendy

Terao Yoshitaka | Zendy; Miyama Takashi | Zendy; Yamada Yukika | Zendy; Komatsu Takashi | Zendy; Moon CheolHee | Zendy; Oh JeHwan | Zendy; Heo EunGi | Zendy

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29.2: Low‐Cost Barrier Rib and Address Electrode Formation for a 42‐in. High‐Definition PDP

Author(s) -

Terao Yoshitaka,

Miyama Takashi,

Yamada Yukika,

Komatsu Takashi,

Moon CheolHee,

Oh JeHwan,

Heo EunGi

Publication year - 2003

Publication title -

sid symposium digest of technical papers

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.351

H-Index - 44

eISSN - 2168-0159

pISSN - 0097-966X

DOI - 10.1889/1.1832458

Subject(s) - electrode , materials science , photolithography , substrate (aquarium) , slurry , process (computing) , composite material , optoelectronics , computer science , chemistry , geology , operating system , oceanography

The method in which the barrier rib is formed from the glass substrate directly by sandblasting is an effective part of a low cost process, because it can eliminate the baking process and the rib material. Furthermore we developed a new method in which the address electrode is formed without photolithography by using a slurry solution in which the electrode material is dispersed. Finally, we actually produced a 42inch HD‐PDP(1366×768).

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