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23.3: Surface Fluorination of MgO Protective Film to Reduce Chemical Reactivity with H 2 O and CO 2
Author(s) -
Sakurai Hideaki,
Toyoguchi Ginjiro,
Kuromitsu Yoshirou
Publication year - 2003
Publication title -
sid symposium digest of technical papers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.351
H-Index - 44
eISSN - 2168-0159
pISSN - 0097-966X
DOI - 10.1889/1.1832416
Subject(s) - outgassing , fabrication , materials science , deposition (geology) , reactivity (psychology) , surface modification , nanotechnology , chemical engineering , chemistry , engineering , organic chemistry , medicine , paleontology , alternative medicine , pathology , sediment , biology
Just after fabrication of a MgO protective film by EB deposition, a surface modification of the film with a fluorinating gas was performed. This technique achieved a remarkable reduction in the amount of outgassing from the film, and therefore it can be expected to shorten the duration of the gas‐evacuation process in PDP manufacturing.