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17.3: Improvement of the Speed of Address Discharges in Ne‐Xe‐He Discharge Gases for ACPDPs
Author(s) -
Uemura Norihiro,
Yajima Yusuke,
Shibata Masayuki,
Kawanami Yoshimi,
Namiki Fumihiro
Publication year - 2003
Publication title -
sid symposium digest of technical papers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.351
H-Index - 44
eISSN - 2168-0159
pISSN - 0097-966X
DOI - 10.1889/1.1832389
Subject(s) - helium , time lag , lag , atomic physics , ion , plasma , chemistry , discharge coefficient , physics , thermodynamics , nuclear physics , nozzle , computer network , organic chemistry , computer science
The time lag of address discharges is discussed in terms of its relation with discharge gas composition. We measured the discharge time lag in ACPDPs with Ne‐Xe‐He mixed gases. As the concentration of helium increases, the address discharge time lag becomes shortened because helium atoms reduce mostly the formative time lag of the discharge. The formative time lag depends on the ion drift velocity at the initial stage of discharge formation. This ion drift velocity becomes lager with higher helium atom concentration.