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P‐45: Efficient & Selective Rework of LC Alignment Layer with Photo‐Spacer, Protrusion, and Resin Black Matrix on CF & TFT
Author(s) -
Jeong Tonky,
Kim Mel,
Lee Eric,
Kim Paul,
Yeo J. B.,
Lee S. H.,
Chen Liehlin,
Chung Kevin,
Tseng L. H.,
Huang Joseph K.
Publication year - 2003
Publication title -
sid symposium digest of technical papers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.351
H-Index - 44
eISSN - 2168-0159
pISSN - 0097-966X
DOI - 10.1889/1.1832288
Subject(s) - rework , liquid crystal display , materials science , layer (electronics) , matrix (chemical analysis) , composite material , thin film transistor , optoelectronics , chemistry
We have developed the new process about PI Poly Imide: Liquid crystal alignment layer of TFT LCD rework with photo‐spacer and/or protrusion and/or resin black matrix for mass production using new chemical & EPD technology. In case of previous PI rework using O 2 / SF 6 , it is seldom possible to remove selectively PI layer without a little damage to photo‐spacer and/or protrusion and/or resin BM including device characteristics such as I‐V curve of TFT and CIE color coordinates. But the present O 2 / N 2 chemical let the PI layer rework be embodied with a little damage to the photo‐spacer and/or protrusion and/or resin Black Matrix replaced for previous Cr metal BM. Therefore, it is possible for TFT LCD makers to cut‐down drastically the failure‐cost in case of using photo‐spacer narrow & constant cell gap and/or protrusion Vertical Alignment mode‐multi vertical alignment for wide viewing angle and/or resin BM for the 5 th generation mother glass size TFT‐LCD.