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P‐41: Novel Fabricating Process for Nanocrystalline Indium Tin Oxide Thin Film for Flexible Substrate by Low‐temperature One‐time Mixing and Oxidation LOMO
Author(s) -
Hong SungJei,
Kim YongHoon,
Lee ChanJae,
Han JeongIn
Publication year - 2003
Publication title -
sid symposium digest of technical papers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.351
H-Index - 44
eISSN - 2168-0159
pISSN - 0097-966X
DOI - 10.1889/1.1832284
Subject(s) - nanocrystalline material , materials science , indium tin oxide , thin film , tin , substrate (aquarium) , indium , chemical engineering , tin oxide , oxide , transmittance , optoelectronics , nanotechnology , metallurgy , oceanography , geology , engineering
Nanocrystalline indium‐tin‐oxide particles were successfully synthesized with the help of newly developed low‐temperature one‐time mixing and oxidation LOMO method. The process temperature did not exceed 300°C by the exclusion of chloride ions from the synthetic materials. The synthesized nanocrystalline particles showed the ultrafine size below 3 nm and ultrahigh specific surface area above 117 m 2 /g. Also, using the particles and ITO sol, nanocrystalline ITO thin film could be successfully fabricated with good optical transmittance over 83%.

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