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P‐66: New Photo‐Alignment Technology Based on Chalcone Moieties: Molecular Design and Process Development
Author(s) -
Nakata S.,
Kimura M.,
Kumano A.,
Takeuchi Y.
Publication year - 2001
Publication title -
sid symposium digest of technical papers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.351
H-Index - 44
eISSN - 2168-0159
pISSN - 0097-966X
DOI - 10.1889/1.1831987
Subject(s) - chalcone , degeneracy (biology) , materials science , optics , development (topology) , process (computing) , surface tension , surface (topology) , nanotechnology , optoelectronics , computer science , chemistry , organic chemistry , physics , bioinformatics , mathematical analysis , mathematics , quantum mechanics , biology , operating system , geometry
In this paper, factors affecting the pretilt angle are investigated for our newly‐developed photo‐alignment materials. We believe that two factors are crucial for the pretilt angle generation. That is, surface tension of the alignment films, and the incident angle of the LPUV light which may affect the surface order degeneracy. In addition, our development efforts of the photo‐alignment materials will be shortly summarized.