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P‐45: Performance of in‐situ Laser Vacuum Sealing and Annealing on the Panel for the Application of Field Emission Displays
Author(s) -
Hong J. P.,
Seo D. S.,
Kim C. O.,
Cha S. N.,
Song B. K.,
Park N. S.,
Lee N. S.,
Kim J. M.,
Chee J. K.
Publication year - 2001
Publication title -
sid symposium digest of technical papers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.351
H-Index - 44
eISSN - 2168-0159
pISSN - 0097-966X
DOI - 10.1889/1.1831966
Subject(s) - materials science , laser , annealing (glass) , phosphor , brightness , optoelectronics , frit , anode , field electron emission , irradiation , vacuum chamber , optics , laser power scaling , cathode , composite material , electrical engineering , electrode , chemistry , physics , quantum mechanics , nuclear physics , electron , engineering
In‐situ laser sealing and annealing treatments have been performed inside a high vacuum chamber for efficient completion process of field emission displays. A high power Nd:YAG continuous wave (λ = 1,064nm) laser was mainly used as an irradiation source was used as a source. In a packaging scheme, the most vital part of the panel was kept at temperature below 300°C to shorten the entire panel process. Experimental work exhibits efficiently local hitting of frit by the laser to stitch both cathode and anode plate during the short time. In addition, laser treatment on electrophoretically deposited phosphors has been carried out as one of efficient post‐annealing methods in order to improve the brightness of the phosphor coated on indium‐tin oxide‐coated glasses. For the annealing process, two basic parameters, such as laser power and treatment time were examined inside the same vacuum chamber. The experimental results presented useful laser‐annealing time and enhanced improvement of about 10% in the brightness after the laser irradiation on the phosphor. The improvement in the brightness was thought due to the surface cleaning effect on the phosphor surface.