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44.2: Fifth Generation PECVD System for AM‐LCD Manufacturing
Author(s) -
Blonigan W.,
Shang Q.,
Harshbarger W. R.,
Keller E.,
Law K.
Publication year - 2001
Publication title -
sid symposium digest of technical papers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.351
H-Index - 44
eISSN - 2168-0159
pISSN - 0097-966X
DOI - 10.1889/1.1831764
Subject(s) - liquid crystal display , manufacturing process , plasma enhanced chemical vapor deposition , metre , computer science , engineering , automotive engineering , computer hardware , manufacturing engineering , materials science , optoelectronics , operating system , chemical vapor deposition , physics , astronomy , composite material
AKT, Inc. has developed a PECVD system for processing the fifth generation of technology for manufacturing AM‐LCDs on substrates that are approximately 1 meter × 1 meter. The system has a cluster tool configuration with 5 process chambers. Trends in the manufacturing of a‐Si LCDs on large substrates are reviewed.