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44.1: Invited Paper : New Approaches to Process Simplification for Large Area and High Resolution TFT‐LCD
Author(s) -
Hong MunPyo,
Roh NamSeok,
Hong WanShick,
Chung KyuHa
Publication year - 2001
Publication title -
sid symposium digest of technical papers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.351
H-Index - 44
eISSN - 2168-0159
pISSN - 0097-966X
DOI - 10.1889/1.1831762
Subject(s) - color gel , liquid crystal display , thin film transistor , filter (signal processing) , brightness , layer (electronics) , process (computing) , materials science , optoelectronics , color filter array , substrate (aquarium) , computer science , nanotechnology , optics , computer vision , oceanography , physics , geology , operating system
Novel process architectures are proposed for fabricating large area, high resolution TFT‐LCD's with a minimal number of process steps. A low contact resistance between Al bus lines and transparent conductive oxide layer, necessary for large‐area panels, is obtained by inducing a self‐formed, inter‐metallic compound layer at the interface without using any additional buffer or capping layers. For enhanced brightness and resolution, a new TFT array structure integrated on a color filter substrate, named Array on Color Filter (AOC) structure, has been developed. Good quality TFT's are successfully constructed on the newly developed color filter for AOC within a sufficiently wide process margin. By adopting these novel technologies, a 17.0″ SXGA prototype panel is fabricated and shows good display performance.
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