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LP‐9: Late News Poster: Patterned Alignment Layers Using Holographic Exposure Technique
Author(s) -
Eakin James N.,
Xie Yunhe,
Pelcovits Robert A.,
Crawford Gregory P.,
Radcliffe Marc D.
Publication year - 2004
Publication title -
sid symposium digest of technical papers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.351
H-Index - 44
eISSN - 2168-0159
pISSN - 0097-966X
DOI - 10.1889/1.1831044
Subject(s) - holography , layer (electronics) , variety (cybernetics) , materials science , computer science , optoelectronics , optics , nanotechnology , artificial intelligence , physics
We present a novel method to create patterned alignment layers using holography with a photopolymerizable layer, and show the various types of alignments that are possible. The technique is very flexible and can create a rich variety of new configurations, not possible with conventional lithograph patterning techniques.