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LP‐8: Late News Poster: Ion Beam Sputter Deposition Process of Inorganic Vertical Alignment Layers
Author(s) -
Murauski A.,
Khakhlou A.,
Shiripov V.,
Gerasimovich A.
Publication year - 2004
Publication title -
sid symposium digest of technical papers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.351
H-Index - 44
eISSN - 2168-0159
pISSN - 0097-966X
DOI - 10.1889/1.1831043
Subject(s) - materials science , substrate (aquarium) , sputtering , deposition (geology) , ion beam , ion , beam (structure) , thin film , coating , silicon , condensation , ion plating , silicon dioxide , optics , crystal (programming language) , optoelectronics , nanotechnology , chemistry , composite material , paleontology , oceanography , physics , organic chemistry , sediment , geology , computer science , biology , programming language , thermodynamics
The research results of silicon dioxide thin films alignment properties is presented. The films was deposited by oblique ion beam sputtering on glass substrate. Films thickness and angle condensation influences on the value of pretilt angle of liquid crystal vertical alignment mode is shown. Role of the surface morphology of alignment layers is discussed. The highly uniform vertical alignment layers can be produced using ion beam coating on the substrates with dimensions 300 × 400mm and more.