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6.4: Crystallization of Ultra‐low Temperature ITO by XeCl Excimer Laser Annealing
Author(s) -
Chung Wonsuk,
Thompson Michael O.,
Wickboldt Paul,
Toet Daniel,
Carey Paul G.
Publication year - 2002
Publication title -
sid symposium digest of technical papers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.351
H-Index - 44
eISSN - 2168-0159
pISSN - 0097-966X
DOI - 10.1889/1.1830864
Subject(s) - materials science , crystallinity , annealing (glass) , excimer laser , crystallization , fluence , optoelectronics , laser , sputter deposition , surface finish , surface roughness , sputtering , excimer , optics , thin film , composite material , nanotechnology , chemical engineering , physics , engineering
The effect of excimer laser (XeCl, λ=308nm) annealing on ITO films deposited at 25°C using DC magnetron sputtering has been studied. With increasing laser fluence, the film crystallinity is improved while retaining the as‐deposited <111> texture. Electrical conductivity, optical transparency, and surface roughness are all significantly enhanced by the laser annealing.