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9.4: Self‐Aligned Phosphor Patterning Techniques for Inorganic EL Displays
Author(s) -
Seale D.,
Rodrigues L.,
Werner C.,
Irvine D.
Publication year - 2002
Publication title -
sid symposium digest of technical papers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.351
H-Index - 44
eISSN - 2168-0159
pISSN - 0097-966X
DOI - 10.1889/1.1830136
Subject(s) - phosphor , resist , materials science , nanotechnology , process (computing) , optoelectronics , computer science , layer (electronics) , operating system
Techniques have been developed for patterning a variety of phosphor systems for inorganic EL displays. Negative resist systems are used to prevent exposure of sensitive sulfide‐based phosphors to water. This results in patterned phosphor brightnesses that are comparable to unpatterned panels. Also, the process is partially self‐aligning, thus reducing the number of patterning steps required.