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Optimization of low‐temperature poly‐Si TFT‐LCDs and a large‐scale production line for large glass substrates
Author(s) -
Yoneda Kiyoshi,
Ogata Hidenori,
Yuda Shinji,
Suzuki Kohji,
Yamaji Toshifumi,
Nakanishi Shiro,
Yamada Tsutomu,
Morimoto Yoshihiro
Publication year - 2001
Publication title -
journal of the society for information display
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.578
H-Index - 52
eISSN - 1938-3657
pISSN - 1071-0922
DOI - 10.1889/1.1828785
Subject(s) - photolithography , thin film transistor , substrate (aquarium) , materials science , production line , scale (ratio) , excimer laser , wafer , chemical vapor deposition , production (economics) , line (geometry) , optoelectronics , nanotechnology , laser , optics , mechanical engineering , physics , oceanography , geometry , mathematics , layer (electronics) , quantum mechanics , geology , engineering , economics , macroeconomics
— An update of the progress of inherently low‐temperature poly‐Si (LTPS) technologies, such as ELA, ion doping, and activation in conjunction with chemical vapor deposition (CVD) and photolithography will be given. We will also discuss whether LTPS LCDs will be applied to a large‐scale production line using a large motherglass substrate. It was found that a more‐powerful excimer laser as well as photolithography with higher‐resolution and a more‐precise overlaid arrangement would enable a large‐scale production line handling motherglass of 4th generation size to be constructed in the very near future with reasonable investment and productivity costs.