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40.4: New Photoalignment Polymeric Materials with Excellent Photosensitivity and Stability
Author(s) -
Li X.,
Zhong Z.,
Lee S. H.,
Lee M.H.
Publication year - 2004
Publication title -
sid symposium digest of technical papers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.351
H-Index - 44
eISSN - 2168-0159
pISSN - 0097-966X
DOI - 10.1889/1.1825725
Subject(s) - photosensitivity , polyimide , thermal stability , materials science , irradiation , polymer , anisotropy , side chain , optoelectronics , polymer chemistry , chemical engineering , composite material , chemistry , optics , organic chemistry , layer (electronics) , physics , nuclear physics , engineering
Novel soluble photoalignment materials with high photosensitivity and good thermal stability were synthesized by chloromethylation of 6FDA‐ODA polyimide, and their photoalignment properties were investigated. The photosensitivity of 6FDA‐ODA polyimide was improved greatly by the introduction of chloromethyl side group. The ECB LC cell made with photoaligned films could be stored at 85°C. for at least 14 days without deteriorating LC alignment. The irradiation of polarized UV light on the polymer surface induced thermally stable alignment of LC due to the surface anisotropy caused by photodecomposition of polyimide main chain.