Open AccessSYNTHESIS AND PHOTOSENSITIVE PROPERTIES OF UV-CURABLE/ALKALI-SOLUBLE RESIN AS NEGATIVE PHOTORESIST
Author(s) -
Gao Chao-feng,
Qi Meng,
Chunhui Shen
Publication year - 2018
Publication title -
journal of materials science and engineering with advanced technology
Language(s) - English
Resource type - Journals
ISSN - 0976-1446
DOI - 10.18642/jmseat_7100121898
Subject(s) - photoresist , alkali metal , materials science , photosensitivity , composite material , chemical engineering , polymer chemistry , chemistry , organic chemistry , optoelectronics , layer (electronics) , engineering