Open AccessRESEARCH OF TEMPERATURE AND CONCENTRATION ON ANISOTROPIC WET ETCHING OF MONOCRYSTALLINE SILICON
Author(s) -
Sofya V. Malokhatko,
D.A. Bakshevnikov,
E Yu Gusev
Publication year - 2021
Publication title -
izvestiâ ûfu. tehničeskie nauki
Language(s) - English
Resource type - Journals
eISSN - 2311-3103
pISSN - 1999-9429
DOI - 10.18522/2311-3103-2021-3-128-134
Subject(s) - monocrystalline silicon , etching (microfabrication) , materials science , silicon , surface roughness , substrate (aquarium) , surface finish , aqueous solution , analytical chemistry (journal) , isotropic etching , surface micromachining , composite material , nanotechnology , optoelectronics , chemistry , fabrication , chromatography , layer (electronics) , medicine , oceanography , alternative medicine , pathology , geology