Open AccessRESEARCH OF MASKING PROPERTIES OF SILICONOXIDE FILMS FOR SILICON MEMBRANEFABRICATION BY WET ETCHING
Author(s) -
S. V. Malohatko,
E Yu Gusev
Publication year - 2021
Publication title -
izvestiâ ûfu. tehničeskie nauki
Language(s) - English
Resource type - Journals
eISSN - 2311-3103
pISSN - 1999-9429
DOI - 10.18522/2311-3103-2020-6-196-203
Subject(s) - masking (illustration) , etching (microfabrication) , materials science , silicon , composite material , optoelectronics , art , visual arts , layer (electronics)