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Influence of Plasma-Chemical Modification of the Surface on Transverse Electron Transport and VAC of Silicon MIS Structures
Author(s) -
R. K. Yafarov,
D. V. Nefedov
Publication year - 2019
Publication title -
izvestiâ saratovskogo universiteta. novaâ seriâ. seriâ fizika
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.163
H-Index - 2
eISSN - 2542-193X
pISSN - 1817-3020
DOI - 10.18500/1817-3020-2019-19-1-76-82
Subject(s) - surface modification , transverse plane , silicon , plasma , materials science , electron , chemistry , chemical engineering , physics , optoelectronics , engineering , nuclear physics , structural engineering

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