Open AccessDye-Containing Methacrylic Polymers in the Composition of Photo Resists for Complementary Metal Oxide Semiconductor Image Sensors
Author(s) -
Eui June Jeong,
Shahrokh Motallebi,
Jae Hyun Kim,
Changmin Lee,
Kilsung Lee,
Sina Maghsoodi,
Jong-Seob Kim,
Tuwon Chang
Publication year - 2016
Publication title -
eurasian chemico-technological journal
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.227
H-Index - 9
eISSN - 2522-4867
pISSN - 1562-3920
DOI - 10.18321/ectj280
Subject(s) - photoresist , materials science , resist , colored , color filter array , optoelectronics , polymer , cmos , image sensor , nanotechnology , color gel , computer science , artificial intelligence , layer (electronics) , composite material , thin film transistor
The trend in the development and manufacturing of Complementary Metal Oxide Semiconductor (CMOS) image sensors is to miniaturize pixels on the chips and hence to improve their imaging characteristics by providing a higher image resolution. As CMOS technology scales down into submicron regions, the conventional color filters are no longer suitable for generating the desired optical density. The major drawback of the conventional color filters produced from pigment-based positive tone photosensitive compositions, is the heterogeneous dispersion of pigments in photoresist composition resulting in color irregularities due to coarse particles of the pigments. One of the most perspective ways to solve this problem is a replacing the pigment with a dye as a coloring agent and thus, increasing solubility of the latter to obtain a homogeneous colored photoresist composition. In this paper, several novel red dye-containing materials are synthesized and tested to provide a redcolored photosensitive composition. This red-colored photosensitive composition is very promising for application as color filters for CMOS image sensors with high resolution and high level of integration architecture.