Open AccessElectrodeposition of Mo/MoOx on Copper Substrate from Dimethyl Sulfoxide Solutions
Author(s) -
A. Dauletbay,
Washington Braida,
Mihail Nauryzbaev,
Leila Kudreeva,
Andrey Kurbatov,
Akyl Tulegenov
Publication year - 2011
Publication title -
eurasian chemico-technological journal
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.227
H-Index - 9
eISSN - 2522-4867
pISSN - 1562-3920
DOI - 10.18321/ectj215
Subject(s) - molybdenum , materials science , scanning electron microscope , x ray photoelectron spectroscopy , copper , cyclic voltammetry , alloy , substrate (aquarium) , linear sweep voltammetry , metallurgy , corrosion , electrolyte , voltammetry , metal , nuclear chemistry , electrochemistry , inorganic chemistry , chemical engineering , chemistry , electrode , composite material , oceanography , engineering , geology
Molybdenum (Mo) is a refractory metal used principally as an alloying agent in steels, cast irons, and super alloys to enhance hardness, strength, toughness, wear and corrosion resistance and it is also widely used in catalytic applications, lubricants and pigments. The single electrodeposition of Mo from aqueous solutions cannot be achieved but Mo it can be co-deposited as an alloy with iron group metals (induced co-deposition). In this study, the electrodeposition of Mo/MoO x from dimethyl sulfoxide solutions on a copper substrate has been investigated. Different experimental electrodeposition parameters have been assessed (i.e., supporting electrolyte concentration and small amounts of water to the electrolytic bath) to analyze their influence on mechanism of induced Mo/MoO x deposition. Linear scan voltammetry has been used to follow up the electrodeposition of Mo/MoO x films. Film morphology has been characterized using scanning electron microscopy (SEM), compositional analysis was performed using X-ray photoelectron spectroscopy. Mo bearing films were also chemically characterized by ICP-OES analysis. An electrodeposition mechanism was developed and discussed.