Open AccessEtching of silicon dioxide in off-electrode plasma using a chrome mask
Author(s) -
В. В. Подлипнов,
В. А. Колпаков,
N. L. Kazanskiy
Publication year - 2016
Publication title -
kompʹûternaâ optika
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.491
H-Index - 29
eISSN - 2412-6179
pISSN - 0134-2452
DOI - 10.18287/2412-6179-2016-40-6-830-836
Subject(s) - etching (microfabrication) , raman spectroscopy , electrode , materials science , plasma , reactive ion etching , analytical chemistry (journal) , silicon dioxide , oxide , nitrogen dioxide , dry etching , plasma etching , optoelectronics , nanotechnology , composite material , optics , chemistry , metallurgy , layer (electronics) , physics , organic chemistry , quantum mechanics , chromatography