Open AccessDevelopment of methods for formation and testing of photoresist films with a desired thickness profile when fabricating conformal correctors
Author(s) -
V. P. Korolkov,
А. С. Конченко,
Vadim V. Cherkashin,
N. G. Mironnikov
Publication year - 2016
Publication title -
kompʹûternaâ optika
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.491
H-Index - 29
eISSN - 2412-6179
pISSN - 0134-2452
DOI - 10.18287/2412-6179-2016-40-4-482-488
Subject(s) - photoresist , lithography , materials science , conformal map , optics , maskless lithography , next generation lithography , optoelectronics , specular reflection , laser , resist , nanotechnology , electron beam lithography , layer (electronics) , physics , mathematics , mathematical analysis