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A four-zone reflective azimuthal micropolarizer
Author(s) -
Sergey S. Stafeev,
Anton G. Nalimov,
M. V. Kotlyar,
L. O’Faolain
Publication year - 2015
Publication title -
kompʹûternaâ optika
Language(s) - Uncategorized
Resource type - Journals
SCImago Journal Rank - 0.491
H-Index - 29
eISSN - 2412-6179
pISSN - 0134-2452
DOI - 10.18287/0134-2452-2015-39-5-709-715
Subject(s) - optics , electron beam lithography , azimuth , grating , wavelength , lithography , finite difference time domain method , materials science , gaussian beam , cathode ray , binary number , beam (structure) , gaussian , physics , resist , electron , nanotechnology , arithmetic , mathematics , layer (electronics) , quantum mechanics

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