Open AccessUsing Novel Grey Relational Quantitative Model to Evaluate Magnetron Sputtering Technological Parameters
Author(s) -
Gong Chen,
Lv Zong,
Yuan Zuo,
Junjie Pan,
Xianhua Cai,
Feng Wu,
Dongdong Hou,
Yan Wang
Publication year - 2021
Publication title -
revue des composites et des matériaux avancés
Language(s) - Uncategorized
Resource type - Journals
eISSN - 1958-5799
pISSN - 1169-7954
DOI - 10.18280/rcma.310403
Subject(s) - grey relational analysis , high power impulse magnetron sputtering , sputter deposition , materials science , sputtering , computer science , engineering physics , nanotechnology , engineering , mathematics , statistics , thin film