Open AccessAdvanced Process Control and Critical Dimension Control in Photolithography Process
Author(s) -
Hamza Saghrouchni
Publication year - 2022
Publication title -
international journal of new practices in management and engineering
Language(s) - English
Resource type - Journals
ISSN - 2250-0839
DOI - 10.17762/ijnpme.v11i1s.139
Subject(s) - photolithography , loom , process (computing) , converse , controller (irrigation) , artificial neural network , computer science , control (management) , process control , engineering , engineering drawing , artificial intelligence , nanotechnology , materials science , mathematics , geometry , agronomy , biology , operating system
High volume, practical, assembling of cutting edge' photolithography processes requires top to bottom comprehension of Process and Process-Tool connection to accomplish Advanced Process Control (APC). The process likewise requires a tight control to keep up an ideal entryway CD. The direct loom that is right now being used in most semiconductor offices depends on administrator experience and doesn't give good control on the CD variety. Usage of a programmed input control framework in the business has been troublesome in light of the fact that the CD can't be estimated progressively finished. In this magazine, a neural complex is utilized to anticipate CD dependent on the estimations of thickness, reflectivity, refractive record, and portion. The neural network is prepared utilizing recorded information that are gathered at an assembling office. A neural scheme-based converse model of the progression is created. The opposite model is knock down with the progression model to frame a feed-forward controller.