Open AccessReview on Holographic Techniques for Photolithography
Author(s) -
Dipannita Mondal
Publication year - 2022
Publication title -
international journal of new practices in management and engineering
Language(s) - English
Resource type - Journals
ISSN - 2250-0839
DOI - 10.17762/ijnpme.v11i1s.115
Subject(s) - photolithography , holography , substrate (aquarium) , computer science , materials science , optoelectronics , optics , nanotechnology , physics , geology , oceanography
Holographic methods utilizing spatial modulators to supplant the covers in photolithographic process. PC produced 3D images got from two pictures with known measurements, reproducing a clear visible field Mask and dark prior mask. The reason for the proposal is to consider the potential outcomes of picture decrease, through a holographic based optical segment arrangement, produced by spatial modulators from a CGH (Computer-created Hologram). Comprehend the outcomes by decreasing the pictures and look at the outcomes acquired. Boundaries, for example, complexity, goal and least size of the pictures produced from the spatial modulators will be broke down so as to decide the conceivable outcomes of progress and the confinements of the procedure applied to photolithography. It is accepted that the uniform and dainty oppose film can be effectively kept on the filaments by utilizing the electro-shower covering innovation. Nonetheless, high electronic voltage and conductive surface are required with the goal that the current smaller scale structures are exposed to harm. The immediate splash covering is liberated from electronic and other harm to substrates yet it is influenced by numerous boundaries including the arrangement thickness and substrate temperature.