Open AccessEllipsometry investigation of nucleation and growth of electron cyclotron resonance plasma deposited silicon films
Author(s) -
M. Li,
Y. Z. Hu,
J. F. Wall,
K. A. Conrad,
E. A. Irene
Publication year - 1993
Publication title -
carolina digital repository (university of north carolina at chapel hill)
Language(s) - English
DOI - 10.17615/zmk5-e445
Subject(s) - nucleation , electron cyclotron resonance , silicon , plasma , materials science , ellipsometry , electron , cyclotron resonance , analytical chemistry (journal) , cyclotron , chemistry , thin film , optoelectronics , nanotechnology , physics , nuclear physics , organic chemistry , chromatography
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