Open AccessLimiting Si/SiO2 interface roughness resulting from thermal oxidation
Author(s) -
Luhua Lai,
E. A. Irene
Publication year - 1999
Publication title -
carolina digital repository (university of north carolina at chapel hill)
Language(s) - Uncategorized
DOI - 10.17615/qa3k-ny78
Subject(s) - limiting , interface (matter) , surface finish , thermal , materials science , self limiting , thermal oxidation , engineering physics , silicon , composite material , metallurgy , mechanical engineering , engineering , thermodynamics , physics , medicine , capillary number , dermatology , capillary action
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