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A kinetics study of the electron cyclotron resonance plasma oxidation of silicon
Author(s) -
J. Joseph,
Yi Hu,
E. A. Irene
Publication year - 1992
Publication title -
carolina digital repository (university of north carolina at chapel hill)
Language(s) - English
DOI - 10.17615/nmjg-ax10
Subject(s) - plasma , kinetics , electron cyclotron resonance , silicon , atomic physics , electron , cyclotron , cyclotron resonance , materials science , physics , nuclear physics , optoelectronics , quantum mechanics

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