Open AccessHigh density plasma deposition of device quality silicon nitride. II. Effects of thickness on the electrical properties
Author(s) -
M. C. Hugon,
F. Delmotte,
B. Agius,
E. A. Irene
Publication year - 1999
Publication title -
carolina digital repository (university of north carolina at chapel hill)
Language(s) - English
DOI - 10.17615/h2xn-9j29
Subject(s) - materials science , deposition (geology) , plasma , silicon nitride , nitride , quality (philosophy) , optoelectronics , engineering physics , silicon , composite material , geology , engineering , layer (electronics) , physics , paleontology , quantum mechanics , sediment