Open AccessEffect of deposition time on nanocolumnar TiZrN films grown by reactive magnetron Co-sputtering with the OAD technique
Author(s) -
Wuttichai Phae-ngam,
Chanunthorn Chananawathorn,
Tossaporn Lertvanithphol,
Benjarong Samransuksamer,
Mati Horprathum,
Teera Chaiyakun
Publication year - 2021
Publication title -
materiali in tehnologije
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.27
H-Index - 25
eISSN - 1580-3414
pISSN - 1580-2949
DOI - 10.17222/mit.2019.189
Subject(s) - materials science , deposition (geology) , sputter deposition , sputtering , cavity magnetron , engineering physics , metallurgy , nanotechnology , composite material , thin film , engineering , geology , paleontology , sediment