
Characterization of Double Gate TFET using Different Dielectric Materials
Author(s) -
R. Abisha Herline,
S. Darwin
Publication year - 2017
Publication title -
international journal of innovative research in electrical, electronics, instrumentation and control engineering
Language(s) - English
Resource type - Journals
eISSN - 2321-5526
pISSN - 2321-2004
DOI - 10.17148/ijireeice.2017.5510
Subject(s) - characterization (materials science) , dielectric , materials science , gate dielectric , high κ dielectric , optoelectronics , double gate , nanotechnology , electrical engineering , engineering , transistor , mosfet , voltage