Open AccessINVESTIGATION OF ION−ELECTRON EMISSION IN THE PROCESS OF REACTIVE ION−BEAM ETCHING OF DIELECTRIC THIN FILM HETEROSTRUCTURES
Author(s) -
А. С. Курочка,
А. А. Сергиенко,
С. П. Курочка
Publication year - 2015
Publication title -
izvestiâ vysših učebnyh zavedenij. materialy èlektronnoj tehniki
Language(s) - English
Resource type - Journals
eISSN - 2413-6387
pISSN - 1609-3577
DOI - 10.17073/1609-3577-2015-3-195-200
Subject(s) - reactive ion etching , materials science , ion , heterojunction , dielectric , etching (microfabrication) , electron , optoelectronics , ion beam , cathode ray , thin film , ion beam deposition , nanotechnology , chemistry , physics , organic chemistry , layer (electronics) , quantum mechanics