Open AccessTrimethyl(phenyl)silane — a Precursor for Gas Phase Processes of SiCx : H Film Deposition: Synthesis and Characterization
Author(s) -
N. I. Ermakova,
В. А. Сысоев,
Д. Никулина,
П. Цырендоржиева,
И. Рахлин,
Л. Косинова,
А. М. Кузнецов
Publication year - 2015
Publication title -
izvestiâ vysših učebnyh zavedenij. materialy èlektronnoj tehniki
Language(s) - English
Resource type - Journals
eISSN - 2413-6387
pISSN - 1609-3577
DOI - 10.17073/1609-3577-2014-3-199-205
Subject(s) - silane , deposition (geology) , characterization (materials science) , gas phase , chemical engineering , phase (matter) , chemistry , materials science , organic chemistry , nanotechnology , geology , engineering , paleontology , sediment