Open AccessCellular Automation Model of Phase Separation during Annealing of Non–Soichiometric Silicon Oxide Layers
Author(s) -
Г. Я. Красников,
Н. А. Зайцев,
И. В. Матюшкин,
Sergey V. Korobov
Publication year - 2015
Publication title -
izvestiâ vysših učebnyh zavedenij. materialy èlektronnoj tehniki
Language(s) - English
Resource type - Journals
eISSN - 2413-6387
pISSN - 1609-3577
DOI - 10.17073/1609-3577-2014-2-109-115
Subject(s) - annealing (glass) , silicon , automation , oxide , materials science , chemical engineering , optoelectronics , engineering , metallurgy , mechanical engineering